Fundamentals of Post CMP Cleaning of Dielectric Surface Contamination

Fundamentals of Post CMP Cleaning of Dielectric Surface Contaminated

Understanding the nature of Ceria surface and interaction with the Silica surface are the key to designing the proper cleaner.

AGENDA

  • Fundamentals of Ceria-Silica CMP Process
  • Reactivity Between Ceria and SiO2and Si3N4
  • Commodity Cleaner vs.Formulated Cleaners
  • Formulation Design Concept and Components
  • Ceria Cleaning Mechanism –Spectroscopic Evidences
  • Positive vs. Negatively Modified Ceria Cleaners
  • Entegris Recommendations
  • Conclusions