Effective Slurry Concentration Monitoring Using Refractive Index

wednesday, November 11 at 11 AM EST

Understanding the amount of solids in slurry is critical to determining an accurate material removal rate (MRR) for CMP solutions. Index of refraction (IoR) technology enables concentration monitoring of turbid and nonconductive materials. 

Entegris is introducing a new liquid concentration monitor based on IoR technology that offers high accuracy and repeatability with an optional automated in situ window cleaner to ensure stability over time. Tracy Gast, global product applications engineer, will discuss: 

  • Index of refraction technology
  • Performance of our new InVue® GV148 liquid concentration monitor in slurry
  • Slurry baseline testing with automated in situ window cleaner


About the Presenter

Tracy Gast joined Entegris in August 2016 as a global product applications engineer specializing in chemical concentration and dissolved oxygen monitoring. Prior to Entegris, Tracy spent 32 years
at TEL-FSI as a principal applications engineer responsible for semiconductor applications and equipment development. He has a Bachelor of Science degree in electrical engineering from Minnesota State University, Mankato and holds eight semiconductor processing or equipment related patents.