CMP Technology Day
Maritim HOTEL & CONGRESS CENTER | Dresden, Germany
June 29, 2023
Entegris is pleased to invite you to attend in-person a technology day focusing on Chemical Mechanical Planarization (CMP), one of the most critical applications in chip manufacturing.
Take this unique opportunity to join us on June 29 and collaborate with our experts on your challenges.
| 9:30 | Registration and Welcome Coffee |
| 10:00 | Entegris Today - A New Collaborative Approach Antoine Amade - President EMEA Region |
| 10:15 |
Accelerated Time to Yield with Entegris End-to-End CMP Solutions |
| 10:25 | LFoundry and Entegris: A Success Story of Collaboration Girolamo Penso - CMP Manager at LFoundry |
| 10:55 | Break |
| 11:10 | See the Positive Difference of the New D92XX Slurry Line Federico Barbieri - Sr. Customer Technology Engineer EMEA for CMP |
| 11:35 | Time to Change Your CMP Pad? Discover the Benefits of a Different Technology Mario Stella - Sr. CTE Manager EMEA |
| 12:00 | Networking Lunch sponsored by Entegris |
| 13:30 | Enabling 2.5D/3D IC Heterogeneous Integration and More than Moore Chiplet Scaling with Through-Silicon via, Hybrid Bonding Copper, and Die-Isolation Dielectrics CMP Solutions Jim Hsu - Director of CMP Technologies |
| 14:05 | Real-Time Concentration Measurements for Efficient Process Control Phillipp Lehmann - Field Applications Engineer EMEA |
| 14:25 | Joining Forces in R&D – An Introduction to Our Collaboration Efforts to Improve Defectivity in CMP Clément Castan - R&D Chemical Mechanical Planarization Engineer at CETI-Leti |
| 14:55 | Break |
| 15:15 | Enhance Your Process by Advanced Slurry Filtration Günter Haas, Ph.D. - Field Application Engineer | Liquid Microcontamination Control |
| 15:35 | Complete Slurry Lifecycle LPCs Monitoring and Control with Accusizer® Lab and Online Tools Cyril Tô - Sr. Account Manager | Instrumentation |
| 15:55 | Wrap Up |
